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Brand New Lam Research 685-801852-002 Mass Flow Controller

Brand New Lam Research 685-801852-002 Mass Flow Controller

Brand New Lam Research 685-801852-002 Mass Flow Controller

High precision, stable performance

Suitable for industrial automation

In stock & fast delivery worldwide

  • Item NO.:

    685-801852-002

  • Order(MOQ):

    1

  • Payment:

    100% T/T

  • Product Origin:

    USA

  • Color:

    As Model

  • Shipping Port:

    Xiamen

  • Lead Time：

    2-3 days
Inquire Now
  • Product Details

Description:

LAM Research fiber optic spectrometers are high-precision optical monitoring devices integrated for semiconductor wafer processing equipment. Primarily paired with professional optical modules, they adopt fiber optic transmission design to capture plasma emission, reflection and transmission spectra inside process chambers. Widely used for etch endpoint detection, thin film metrology and real-time plasma condition monitoring, these units ensure stable process performance, improve production yield and reduce defective products in etching, CVD, PVD and other vacuum manufacturing procedures. As original OEM compatible components, they feature excellent compatibility and long-term reliability for LAM full-series process tools.
 
 
 
Key specifications:
  1. Equipped with high-sensitivity CCD/PMT detectors, delivering outstanding spectral resolution and low noise. Covers UV-visible wavelength range to meet diverse semiconductor process monitoring demands.
  2. Standard SMA fiber interfaces support long-distance signal transmission. Vacuum-compatible probes work stably in high-vacuum, high-temperature and plasma environments.
  3. Real-time spectrum analysis enables precise etch endpoint judgment, thin film thickness and optical property measurement, effectively avoiding over-etching and under-etching.
  4. Built-in Ethernet and RS-232 communication ports, fully compatible with LAM equipment protocols for seamless data interaction and system linkage.
  5. Compact and rugged structure with anti-vibration and anti-interference capability. Supports 24/7 continuous operation and easy on-site replacement.
 

 

Typical Applications:

  1. Plasma etching systems, CVD, PVD and ALD thin film deposition equipment
  2. Endpoint detection for wafer etching processes
  3. In-situ thin film thickness and reflectance measurement
  4. Real-time plasma status analysis for vacuum process chambers
  5. LAM Research 2300, 9400, ExAL and other mainstream process platforms

 

 

FAQ:

Q1:What is the product situation and warranty like?
A:Brand-new genuine items. 1-year warranty included.

Q2:What is your payment terms?
A:T/T, Paypal supported.

Q3: What is the delivery time for the product? Is there sufficient inventory?
A:Standard models in stock, shipped in 3–5 business days after payment. Scarce models require manufacturer ordering—contact customer service for timelines.

Q4:Shipping & Tracking
A:DHL/FedEx/UPS available.Tracking number + link provided post-shipment. Full-process monitoring by our team.

Q5:Packaging & Safety

 

A:Original brand packaging with reinforced protection (foam, sealed cartons, wooden crates for precision gear). Moisture & impact resistant.

 

 

Related Tags : Industrial equipment Automation components Mass Flow Controller
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